<p>This study presents a chemo-mechanical polishing model for zinc germanium phosphide crystals through the interaction between the polishing pad, the workpiece surface, and abrasive particles. A Mathematical model is established to analyze the relationship between the Material removal rate and surface roughness, considering factors such as abrasive particle diameter, hardness, polishing time, and applied force. The experimental results show a critical cutting depth threshold of 95.21 nm with a measured polishing load of 10N. The applied polishing method demonstrates Material removal capability through plastic deformation, resulting in a 36.37% reduction in surface roughness and a 24.27% reduction in the Material removal rate compared to purely mechanical polishing. Furthermore, increasing the abrasive particle size, hardness, or polishing load leads to a greater cutting depth and a higher Material removal rate, but may cause nonuniform effects on the surface. Optimization of the polishing process parameters achieved a minimum surface roughness of 1.21 nm, with extended polishing time showing an inverse correlation with both surface roughness and the material removal rate.</p>