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<p>The samples of ta-C films with varying bias substrate were successfully prepared by FCVA deposition technique, and were analyzed by Raman spectroscopy, XPS, SEM, and a three-dimensional surface profiler etc. The structure and corrosion resistance of ta-C films were studied in detail. The results indicated that with the deposition bias substrate increased, the sp<sup>3</sup> hybridized bond content and film thickness of the ta-C films initially rose and then declined. The maximum values were observed at a bias voltage of − 100&#xa0;V. The roughness of the ta-C films was 17-18&#xa0;nm. As the deposition bias voltage increased, the corrosion potential initially rose and then declined, while the corrosion current density initially decreased and then increased. The corrosion resistance of the ta-C films was enhanced and subsequently weakened as the deposition bias voltage increased. When the bias voltage is − 100&#xa0;V, the ta-C film exhibits the maximum corrosion potential of − 431&#xa0;mV, the minimum corrosion current density of 0.734&#xa0;μA/cm<sup>2</sup>, the minimum porosity of 0.03862%, and the maximum protection efficiency of 93.01%. Its corrosion resistance performance is optimal.</p>

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Effect of Bias Substrate on the Structure and Corrosion Resistance of Tetrahedral Amorphous Carbon Thin Films

  • 期刊论文

  • 发表日期：

    2025年2月17日

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  • Rongfa Chen,
  • Chengcong Ye,
  • Xinhao Sun,
  • Fangfang Li,
  • Haibo Chen,
  • Yulong Miao,
  • Zesen Zhao,
  • Yihong Zhao

摘要

The samples of ta-C films with varying bias substrate were successfully prepared by FCVA deposition technique, and were analyzed by Raman spectroscopy, XPS, SEM, and a three-dimensional surface profiler etc. The structure and corrosion resistance of ta-C films were studied in detail. The results indicated that with the deposition bias substrate increased, the sp3 hybridized bond content and film thickness of the ta-C films initially rose and then declined. The maximum values were observed at a bias voltage of − 100 V. The roughness of the ta-C films was 17-18 nm. As the deposition bias voltage increased, the corrosion potential initially rose and then declined, while the corrosion current density initially decreased and then increased. The corrosion resistance of the ta-C films was enhanced and subsequently weakened as the deposition bias voltage increased. When the bias voltage is − 100 V, the ta-C film exhibits the maximum corrosion potential of − 431 mV, the minimum corrosion current density of 0.734 μA/cm2, the minimum porosity of 0.03862%, and the maximum protection efficiency of 93.01%. Its corrosion resistance performance is optimal.