Enhanced Electrical Characteristics and Stability of IGZTO Thin-Film Transistors Prepared Based on Al2O3 Gate Dielectric
摘要
In this paper, high-performance indium gallium zinc tin oxide thin-film transistors (IGZTO TFTs) were fabricated by using a high-k Al2O3 gate dielectric layer deposited via radio-frequency magnetron sputtering. The results demonstrate that low-voltage operation and low subthreshold swing are achieved through the modulation of the Al2O3/oxide active layer interface and effective gate-voltage control. Furthermore, this approach boosts charge carrier transport, leading to improved overall electrical performance and stability. The Al2O3/IGZTO TFTs exhibit excellent characteristics, including a high on/off current ratio of up to 108, threshold voltage tuned to −0.4 V, low subthreshold swing of 78.2 mV/decade, and high field-effect mobility of 40.2 cm2V−1 s−1. These results indicate that Al2O3/IGZTO TFTs prepared at room temperature with high mobility and stability have broad application prospects in the fields of high-end displays and flexible electronics.
Graphical Abstract