Microstructural Properties and Broadband Photosensing Demonstration Using In2O3 Thin Films
摘要
This work presents the efficient broadband photosensing device fabrication and testing of indium oxide thin films. The In2O3 thin film (as optical sensing material)-based photodetectors were fabricated using a standard wafer-scale microfabrication process. The developed In2O3 thin film-based photodetectors offer salient features: higher responsivity, improved detectivity, and higher photo-to-dark current ratio (PDCR). The photodetector showed improved performance metrics for 405 nm, with PDCR, responsivity, and detectivity of 1.39 × 102, 4.152 × 102 A/W, and 1.1 × 1014 cm Hz1/2 W−1, respectively. In addition, the tested devices exhibited highly repeatable results, with a response speed of 0.26/0.37 s. These test results demonstrate the possibility of fabricating a high-performance and highly efficient broadband photodetector using In2O3 thin films for future optoelectronics.