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<p>In the current work, we report on the structural, morphological, linear, nonlinear optical (NLO), and optical limiting properties of Ni co-doped Al:CdO nanostructures. Thin films were produced with various Al and Ni co-doping concentrations (0–10 wt.%) utilizing the spray pyrolysis method. Powder x-ray diffraction (PXRD) studies confirmed that the cubic crystal structure is polycrystalline in nature. The size of the crystallites was determined using the Scherrer rule, indicating enhancement with increasing doping concentrations. Field-emission scanning electron microscopy revealed alterations in the surface morphology. Increasing the doping content led to changes in grain size. With increasing concentrations of Al and Ni doping, linear optical parameters including transmittance (%), linear refractive index, and energy gap (<i>E</i><sub>g</sub>) were found to be improved. To investigate the NLO parameters, open-aperture and closed-aperture Z-scan measurements were conducted using solid-state continuous-wave laser irradiation at 532&#xa0;nm. Improvements in the third-order NLO parameters were found with increased Al and Ni co-doping content in the nanostructured CdO thin films, including the nonlinear absorption coefficient (<i>β</i>), which ranged from approximately 0.542 × 10<sup>−3</sup> to 4.854 × 10<sup>−3</sup>&#xa0;cm/W, the nonlinear refractive index (<InlineEquation ID="IEq1"> <InlineMediaObject> <ImageObject Color="BlackWhite" FileRef="11664_2024_11730_Article_IEq1.gif" Format="GIF" Height="12" Rendition="HTML" Resolution="72" Type="Linedraw" Width="18" /> </InlineMediaObject> <EquationSource Format="TEX">\({n}_{2}\)</EquationSource> <EquationSource Format="MATHML"><math> <msub> <mi>n</mi> <mn>2</mn> </msub> </math></EquationSource> </InlineEquation>) with values between −1.35 × 10<sup>-8</sup> and −1.93 × 10<sup>−8</sup> cm<sup>2</sup>/W, and the NLO susceptibility (χ<sup>(3)</sup>), in the range of 8.31 x 10<sup>−7</sup> to 2.03 × 10<sup>−6</sup> esu. The optical limiting properties of the prepared Cd<sub>1−x</sub>Al<sub>x</sub>Ni<sub>x</sub>O nanostructure were also studied, and the limiting thresholds were found to be improved by doping. Therefore, the results from the structural, linear, and NLO studies confirm the potential of Cd<sub>1−x</sub>Al<sub>x</sub>Ni<sub>x</sub>O thin films for applications in the field of optoelectronic devices.</p>

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Continuous-Wave Laser-Induced Nonlinear Optical Susceptibility (χ(3)) and Limiting Properties of Ni Co-doped Al:CdO Nanostructures for Optoelectronic Applications

  • 期刊论文

  • 发表日期：

    2025年1月23日

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  • Raghavendra Bairy,
  • J. S. Vishwanatha,
  • R. Mohan Reddy,
  • D. Haleshappa,
  • M. Banuprakash

摘要

In the current work, we report on the structural, morphological, linear, nonlinear optical (NLO), and optical limiting properties of Ni co-doped Al:CdO nanostructures. Thin films were produced with various Al and Ni co-doping concentrations (0–10 wt.%) utilizing the spray pyrolysis method. Powder x-ray diffraction (PXRD) studies confirmed that the cubic crystal structure is polycrystalline in nature. The size of the crystallites was determined using the Scherrer rule, indicating enhancement with increasing doping concentrations. Field-emission scanning electron microscopy revealed alterations in the surface morphology. Increasing the doping content led to changes in grain size. With increasing concentrations of Al and Ni doping, linear optical parameters including transmittance (%), linear refractive index, and energy gap (Eg) were found to be improved. To investigate the NLO parameters, open-aperture and closed-aperture Z-scan measurements were conducted using solid-state continuous-wave laser irradiation at 532 nm. Improvements in the third-order NLO parameters were found with increased Al and Ni co-doping content in the nanostructured CdO thin films, including the nonlinear absorption coefficient (β), which ranged from approximately 0.542 × 10−3 to 4.854 × 10−3 cm/W, the nonlinear refractive index ( \({n}_{2}\) n 2 ) with values between −1.35 × 10-8 and −1.93 × 10−8 cm2/W, and the NLO susceptibility (χ(3)), in the range of 8.31 x 10−7 to 2.03 × 10−6 esu. The optical limiting properties of the prepared Cd1−xAlxNixO nanostructure were also studied, and the limiting thresholds were found to be improved by doping. Therefore, the results from the structural, linear, and NLO studies confirm the potential of Cd1−xAlxNixO thin films for applications in the field of optoelectronic devices.