The Preferential Growth Behaviors of Cu–Al Intermetallics Under the Electric Current
摘要
It was observed in this study that the intermetallics formed at the Cu/Al interface tend to grow preferentially along specific crystallographic orientations under the influence of electric current. Unlike that the intermetallics generated without preferential growth characteristics in the absence of current, the Al2Cu grows preferentially along [001] and Al4Cu9 grows preferentially along the [111] in the current direction under the current density of 312.5 to 1000 A/cm2. Furthermore, the preferential growth characteristics of these intermetallics become more prominent with the increase of current density. Based on this phenomenon, the intermetallics were synthesized by in-situ reaction between Cu powder and Al powder with the assistance of electric current. The results indicate that both Al2Cu and Al4Cu9 demonstrate highly pronounced preferential orientation characteristics, thereby validating the feasibility of utilizing electric current to prepare anisotropic materials with preferential orientation properties.