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<p>Photolithography-assisted chemo-mechanical etching (PLACE), a dedicated fabrication methodology for high-quality (high-<i>Q</i>) large-scale photonic integrated circuits (PICs) on thin-film lithium niobate (TFLN), has enabled the realization of diverse PICs spanning from high-<i>Q</i> micro-resonators to waveguide amplifiers and programmable photonic circuits. To advance high-throughput TFLN PICs manufacturing, we developed a laser lithography technique employing a high repetition-rate femtosecond laser and a high-speed polygon scanner, achieving a lithography throughput of 2.4 cm<sup>2</sup>/h and optical propagation loss below 0.1 dB/cm. System capabilities are further evidenced by the demonstration of wafer-scale fabricated TFLN photonic devices, confirming the scalability and performance of this lithographic platform.</p>

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High-speed femtosecond laser lithography for low-loss wafer-scale lithium niobate integrated photonics

  • 期刊论文

  • 发表日期：

    2025年12月11日

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  • Weimin Huang,
  • Jinming Chen,
  • Lvbin Song,
  • Zhaoxiang Liu,
  • Jianping Yu,
  • Yunpeng Song,
  • Min Wang,
  • Ya Cheng

摘要

Photolithography-assisted chemo-mechanical etching (PLACE), a dedicated fabrication methodology for high-quality (high-Q) large-scale photonic integrated circuits (PICs) on thin-film lithium niobate (TFLN), has enabled the realization of diverse PICs spanning from high-Q micro-resonators to waveguide amplifiers and programmable photonic circuits. To advance high-throughput TFLN PICs manufacturing, we developed a laser lithography technique employing a high repetition-rate femtosecond laser and a high-speed polygon scanner, achieving a lithography throughput of 2.4 cm2/h and optical propagation loss below 0.1 dB/cm. System capabilities are further evidenced by the demonstration of wafer-scale fabricated TFLN photonic devices, confirming the scalability and performance of this lithographic platform.