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<p>The impact of gamma irradiation on the optical response and structural integrity of erythrosine B (EB) thin films made by spin coating on glass and quartz substrates systematically investigated in this work. As confirmed by FTIR analysis, the results clearly show that gamma irradiation is a useful technique for modifying the optical characteristics of EB films without sacrificing their molecular structure.The optical band gap, refractive index, optical dispersion, dielectric constants, optical conductivity, and energy loss functions are all significantly and consistently altered by radiation, which indicates the suitability of EB as a radiation - sensitive optical material. These changes are ascribed to changes in defect density and electronic polarizability. The significant radiation sensitivity of EB films is confirmed by the observed increase in refractive index, as well as the regulated changes in dispersion and dielectric properties. These results demonstrate the potential of EB thin films for radiation-responsive photonic and optoelectronic applications.</p>

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γ-Radiation induced changes in the optoelectrical properties of erythrosine B films for potential radiation sensing

  • 期刊论文

  • 发表日期：

    2026年2月18日

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  • Nwuyer A. Al-Shammari,
  • S. M. AlShomar,
  • Hissah Saedoon Albaqawi,
  • D. Mohammed,
  • Fekhra Hedhili

摘要

The impact of gamma irradiation on the optical response and structural integrity of erythrosine B (EB) thin films made by spin coating on glass and quartz substrates systematically investigated in this work. As confirmed by FTIR analysis, the results clearly show that gamma irradiation is a useful technique for modifying the optical characteristics of EB films without sacrificing their molecular structure.The optical band gap, refractive index, optical dispersion, dielectric constants, optical conductivity, and energy loss functions are all significantly and consistently altered by radiation, which indicates the suitability of EB as a radiation - sensitive optical material. These changes are ascribed to changes in defect density and electronic polarizability. The significant radiation sensitivity of EB films is confirmed by the observed increase in refractive index, as well as the regulated changes in dispersion and dielectric properties. These results demonstrate the potential of EB thin films for radiation-responsive photonic and optoelectronic applications.