<p>Wafer-scale metasurface planar optics has emerged as a pivotal field in micro-nano photonics, enabling precise light-field manipulation through semiconductor-compatible manufacturing of artificially designed nanostructures. This paper provides a comprehensive review of recent research progress across four primary material platforms: silicon, <InlineEquation ID="IEq1"> <EquationSource Format="TEX">\(\text{SiO}_{2}\)</EquationSource> </InlineEquation> glass, lithium niobate (LN), and perovskites. We evaluate each platform’s unique advantages and limitations regarding optical efficiency, scalability, and operational stability. Silicon and <InlineEquation ID="IEq2"> <EquationSource Format="TEX">\(\text{SiO}_{2}\)</EquationSource> </InlineEquation> glass remain the most mature for dense integration and large-aperture imaging, while lithium niobate and perovskites offer transformative potential for active modulation and tunable optoelectronics. Furthermore, we discuss critical challenges in nanofabrication precision and material compatibility, concluding with an outlook on future trends such as hybrid manufacturing and AI-assisted system-level co-design.</p>

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Research progress on wafer-scale metasurface plane optics

  • Shuo Qiao,
  • Bo Zhang,
  • Zhangfu Huang,
  • Jiaqi Wang,
  • Zhengyu Wu,
  • Feng Shi

摘要

Wafer-scale metasurface planar optics has emerged as a pivotal field in micro-nano photonics, enabling precise light-field manipulation through semiconductor-compatible manufacturing of artificially designed nanostructures. This paper provides a comprehensive review of recent research progress across four primary material platforms: silicon, \(\text{SiO}_{2}\) glass, lithium niobate (LN), and perovskites. We evaluate each platform’s unique advantages and limitations regarding optical efficiency, scalability, and operational stability. Silicon and \(\text{SiO}_{2}\) glass remain the most mature for dense integration and large-aperture imaging, while lithium niobate and perovskites offer transformative potential for active modulation and tunable optoelectronics. Furthermore, we discuss critical challenges in nanofabrication precision and material compatibility, concluding with an outlook on future trends such as hybrid manufacturing and AI-assisted system-level co-design.