<p>The science of nuclear forensics is essential for the global effort against illicit trafficking of nuclear (or radiological) materials. One of the most common interdicted materials is uranium. Hence, combating the diverting of uranium compounds from their legal uses, such as the nuclear fuel cycle, is critical. This work describes a set of measurements to establish relations between the time elapsed since the exposure of UO<sub>2</sub>F<sub>2</sub>, U<sub>3</sub>O<sub>8</sub> and UO<sub>3</sub>, to different environmental conditions. It was found that these uranium compounds react differently with humidity, as a function of time, to present measurable parameters, used to estimate how long they were exposed to the specific conditions. Ion beam depth profiling utilized by ToF-SIMS on one UO<sub>2</sub>F<sub>2</sub> particle as a function of exposure time, yielded significant related data. Yet, a second set of depth profile measurements on a set of 10 UO<sub>2</sub>F<sub>2</sub> particles, followed by statistical analysis, did not find significant differences between the exposure periods.</p>

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The fate of selected uranium compounds exposed to the environment

  • Dima Libman,
  • Eyal Elish,
  • Shmuel Samuha,
  • Eyal Grinberg,
  • Dvir Fadel,
  • Nir Ashrov,
  • Maor Assulin,
  • Noa Fruchter,
  • Elad Edri,
  • Anna-Eden Kossoy,
  • Itzhak Sedgi,
  • Itzhak Orion

摘要

The science of nuclear forensics is essential for the global effort against illicit trafficking of nuclear (or radiological) materials. One of the most common interdicted materials is uranium. Hence, combating the diverting of uranium compounds from their legal uses, such as the nuclear fuel cycle, is critical. This work describes a set of measurements to establish relations between the time elapsed since the exposure of UO2F2, U3O8 and UO3, to different environmental conditions. It was found that these uranium compounds react differently with humidity, as a function of time, to present measurable parameters, used to estimate how long they were exposed to the specific conditions. Ion beam depth profiling utilized by ToF-SIMS on one UO2F2 particle as a function of exposure time, yielded significant related data. Yet, a second set of depth profile measurements on a set of 10 UO2F2 particles, followed by statistical analysis, did not find significant differences between the exposure periods.