Fabrication of thin 194, 198Pt targets by using evaporation techniques at IUAC
摘要
Thin isotopic platinum targets of thickness in the order of µg/cm2, with carbon backing were fabricated by using physical vapour deposition technique through thermal heating and electron source gun simultaneously. Thickness and elemental (composition) contamination of the targets have been analyzed by using characterization techniques such as, α-particle energy loss, Rutherford Back Scattering and Energy Dispersive X-ray spectroscopy. The present results indicates that there are no measurable impurities, confirming the high purity and robustness of the fabricated targets.