Non-uniform barrier height approach to characterize the quality of resistive switching element formed with polyvinyl alcohol
摘要
In this study, Al/PVA/Al resistive switching devices were fabricated with different annealing temperatures of polyvinyl alcohol (PVA) to investigate the effect of interface quality, using other models for understanding non-equilibrium Schottky junctions. These junctions showed bistable switching behavior with significant cyclability, non-volatility, and rewritability. The current–voltage (I-V) characteristics of the resistive switching loop area, a significant aspect in identifying interface quality tuned in a limited annealing window from 305 K to 363 K, indicate charge blockage. The metal–semiconductor junction parameters like reverse saturation current (J0), ideality factor (