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<p>Vanadium dioxide (VO<sub>2</sub>) is a phase transition material that experiences significant shifts in electrical, optical, and mechanical properties near its transition temperature. Among various methods for depositing VO<sub>2</sub> thin films, pulsed laser deposition (PLD) provides precise stoichiometric control, good versatility, and high consistency. In this work, we introduce an optimized PLD-based method for depositing high-quality polycrystalline VO<sub>2</sub> thin films. Experimental results demonstrate a resistance change of over four orders of magnitude during the phase transition, accompanied by high uniformity, with a thickness variation of less than 2% across a 100&#xa0;mm wafer, and reliable reproducibility over time.</p>

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High-quality polycrystalline vanadium dioxide thin films deposited via pulsed laser deposition with high uniformity and consistency

  • 期刊论文

  • 出版模式：

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  • 发表日期：

    2025年10月11日

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  • Zhixiang Huang,
  • Kyle Laskowski,
  • Sai Rahul Sitaram,
  • Eric Herrmann,
  • S M Jahadun Nobi,
  • Ke Ma,
  • Xi Wang

摘要

Vanadium dioxide (VO2) is a phase transition material that experiences significant shifts in electrical, optical, and mechanical properties near its transition temperature. Among various methods for depositing VO2 thin films, pulsed laser deposition (PLD) provides precise stoichiometric control, good versatility, and high consistency. In this work, we introduce an optimized PLD-based method for depositing high-quality polycrystalline VO2 thin films. Experimental results demonstrate a resistance change of over four orders of magnitude during the phase transition, accompanied by high uniformity, with a thickness variation of less than 2% across a 100 mm wafer, and reliable reproducibility over time.