Enhanced responsive and stable platinum thin-film resistor for wide temperature ranges
摘要
With the rapid development of miniaturized electronic devices, enhancing the response performance of thin-film thermal resistors is essential. In this study, a Pt thin-film thermal resistor was fabricated for applications requiring operation across a wide temperature range exceeding 600 °C. The effect of the macrostructure of the sensitive layer on response time and thermal stress was designed using a finite element simulation. Based on these insights, miniaturized Pt thin-film thermal resistors were successfully fabricated on an AlN ceramic substrate featuring an optimized structure and a fast dynamic response time of approximately 40 ms. Thermal stability was significantly improved through thermal treatment, attributed to the optimized microstructure of the Pt thin film. Furthermore, two methods were employed to evaluate the dynamic response time, laser heating, and water immersion. Results showed that compared to water immersion, laser heating was less affected by heat transfer from the substrate, resulting in more accurate response time measurements. These findings provide valuable insights for the continued development of high-performance miniaturized thermal sensing devices.