<p>The Zr-doped Co<sub>3</sub>O<sub>4</sub> films were prepared using chemical solution deposition method, and the influence of Zr doping content on the resistive switching performance of spinel Co<sub>3</sub>O<sub>4</sub> films was investigated. The Pt/Zr<sub>0.05</sub>Co<sub>2.95</sub>O<sub>4</sub>/Pt (Pt/5ZCO/Pt) device exhibits typical bipolar resistive switching behavior, with the formation voltage and the set and reset voltage distributions being the most concentrated among all the devices tested. Additionally, superior retention performance and long cycling lifetime were demonstrated. The enhancement in the resistive switching properties can be attributed to the improved distribution of oxygen vacancies within the films due to Zr-doping, which reduces the randomness in the rupture and formation of conductive filaments. Regardless of whether at room temperature or low temperature, the low resistance state of the device follows an Ohmic conduction mechanism, while the high resistance state is consistent with a Schottky emission mechanism. This study highlights the potential application of Zr-doped Co<sub>3</sub>O<sub>4</sub> thin films in memristor technology.</p>

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Zirconium-doping improved resistive switching characteristics of cobalt oxide resistive random access memory devices

  • Qi Liao,
  • Ling Du,
  • Ni Qin,
  • Zhuoyang Lou,
  • Dinghua Bao

摘要

The Zr-doped Co3O4 films were prepared using chemical solution deposition method, and the influence of Zr doping content on the resistive switching performance of spinel Co3O4 films was investigated. The Pt/Zr0.05Co2.95O4/Pt (Pt/5ZCO/Pt) device exhibits typical bipolar resistive switching behavior, with the formation voltage and the set and reset voltage distributions being the most concentrated among all the devices tested. Additionally, superior retention performance and long cycling lifetime were demonstrated. The enhancement in the resistive switching properties can be attributed to the improved distribution of oxygen vacancies within the films due to Zr-doping, which reduces the randomness in the rupture and formation of conductive filaments. Regardless of whether at room temperature or low temperature, the low resistance state of the device follows an Ohmic conduction mechanism, while the high resistance state is consistent with a Schottky emission mechanism. This study highlights the potential application of Zr-doped Co3O4 thin films in memristor technology.