<p>Permalloy thin films were efficaciously produced via thermal evaporation under vacuum. They are deposited on Si (111) substrates. The thickness is ranging from 16 to 45&#xa0;nm. We study the impact of the magnetic deposited layer thickness on the electrical and magnetic properties of these Ni₈₀Fe₂₀ films. To quantify the films, we used Rutherford backscattering spectroscopy technique. To analyze the structure and to observe the surface morphology and the film roughness, we used X-ray diffraction as well as the atomic force microscope tools. All the films crystallize in the face-centered cubic structure and exhibited <i>a</i> &lt; 111 &gt; favoured orientation. The crystallite size as well as the lattice parameter and the microstrain increase with thickness. Electrical and magnetic properties are studied by means of Hall Effect measurement system and Vibrating Sample Magnetometer tools. The increase of the magnetic layer provokes a decrease of electrical resistivity and an increase for both the magnetoresistance and the electron mobility. Spontaneous magnetization increases with increasing thickness till 30&#xa0;nm, before stabilizing at bulk value for 45-nm-thick film. Coercivity decreases with increasing thickness following <i>t</i>^<i>−n</i> Néel law. Also, coercivity behavior has been found consistent with the model of random anisotropy. All these findings, and others, contribute to a more comprehension of Permalloy properties and expand their industrial applications.</p>