High-performance flexible DMD transparent electrodes via AZO/Ni/Ag/Ni/AZO multilayer optimization
摘要
The DMD multilayer transparent conducting films were deposited on flexible glass substrates at room temperature using DC and RF magnetron sputtering. After parameter optimization, Ag film thicknesses ranging from 4 to 12 nm were selected to investigate the influence of Ag film thickness on the structural characteristics and photoelectric properties of the glass samples. The results indicate that the photoelectric properties of the samples are strongly dependent on the thickness of the Ag layer. As the thickness of the intermediate Ag layer increases, the average light transmission in the wavelength range of 380 to 760 nm initially rises and then decreases. The absorption edge shifts toward longer wavelengths (redshift), and the sheet resistance decreases monotonically with increasing Ag layer thickness. The sample with an Ag film thickness of 10 nm exhibits the best overall photoelectric performance. Its average transmittance is 82.4%, carrier concentration is 7.64 × 1021 cm−3, carrier mobility is 7.71 cm2 V−1 s−1, resistivity is 10.6 × 10−5 Ω·cm, and sheet resistance is 11.5 Ω sq−1. The Haacke figure of merit reaches up to 13.0 × 10 −3 Ω−1.