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<p>Nanostructured thin films on silicon and glass substrates have been obtained using high-frequency repetitively pulsed f ~ 10–12 kHz laser radiation with wavelength λ = 1.064 μm and power density q = 33 MW/cm<sup>2</sup> on a piezoceramic PZT-19 target at vacuum chamber pressure p = 2.2·10<sup>–2</sup> mm Hg. The morphology of the thin piezoceramic films was studied using atomic force microscopy. Transmission spectra of the obtained films were investigated in the visible and near- and mid-IR regions. The electrophysical characteristics of PZT-19/Si structures on Si substrate were analyzed.</p>

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Surface Morphology and Optical and Electrophysical Properties of Piezoceramic Films Obtained by Laser Deposition in Vacuum

  • 期刊论文

  • 发表日期：

    2025年3月10日

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  • N. A. Bosak,
  • M. V. Bushinsky,
  • A. N. Chobot,
  • L. Vu. Baran,
  • V. V. Malyutina-Bronskaya,
  • I. A. Taratyn

摘要

Nanostructured thin films on silicon and glass substrates have been obtained using high-frequency repetitively pulsed f ~ 10–12 kHz laser radiation with wavelength λ = 1.064 μm and power density q = 33 MW/cm2 on a piezoceramic PZT-19 target at vacuum chamber pressure p = 2.2·10–2 mm Hg. The morphology of the thin piezoceramic films was studied using atomic force microscopy. Transmission spectra of the obtained films were investigated in the visible and near- and mid-IR regions. The electrophysical characteristics of PZT-19/Si structures on Si substrate were analyzed.