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<p>Understanding the nature of Al–Mg electrodeposition helps in choosing suitable electrochemical systems for obtaining desirable compositions in deposits. Al–Mg alloys were electrodeposited between deposition potentials of –1.05 and –1.70&#xa0;V vs open circuit potential using 62AlCl<sub>3</sub> + 17NaCl + 15KCl + 6MgCl<sub>2</sub> (mol%) at 160—200&#xa0;°C on Cu employing Al and Pt counter electrodes (C.E.), separately. The deposit composition depends on C.E., with Al C.E. yielding a maximum of 4.06 atom% Mg and Pt C.E. offering up to 13.69 atom% Mg. Contrarily, deposit phases are functions of compositions irrespective of the C.E. Deposits up to ~ 4.49 atom% Mg possess only Al-solid solution; whereas those beyond this composition possess both Al-solid solution and Al<sub>12</sub>Mg<sub>17</sub>. When employing Al C.E., the deposit’s less noble metal i.e. Mg content increases with deposition potential and decreases with temperature, suggesting the nature of this electrodeposition as ‘regular’. However, the nature of deposition with Pt C.E. is ‘equilibrium’. These natures are confirmed by the respective composition curves <InlineEquation ID="IEq1"> <EquationSource Format="TEX">\(\left(\frac{\text{A}\text{l}}{\text{M}\text{g}}{|}_{\text{d}\text{e}\text{p}\text{o}\text{s}\text{i}\text{t}} \text{v}\text{e}\text{r}\text{s}\text{u}\text{s} \frac{\text{A}\text{l}}{\text{M}\text{g}}{|}_{\text{e}\text{l}\text{e}\text{c}\text{t}\text{r}\text{o}\text{l}\text{y}\text{t}\text{e}}\right)\)</EquationSource> </InlineEquation>. The curve of Al C.E. lies completely above the ‘composition reference line’ <InlineEquation ID="IEq2"> <EquationSource Format="TEX">\(\left(\frac{\text{A}\text{l}}{\text{M}\text{g}}{|}_{\text{d}\text{e}\text{p}\text{o}\text{s}\text{i}\text{t}}=\frac{\text{A}\text{l}}{\text{M}\text{g}}{|}_{\text{e}\text{l}\text{e}\text{c}\text{t}\text{r}\text{o}\text{l}\text{y}\text{t}\text{e}}\right)\)</EquationSource> </InlineEquation> leading to preferential deposition of Al. In contrast, the curve of Pt C.E. transits across this line and goes from Al to Mg preferential regime. Deposition with Al C.E. is useful in obtaining strictly more noble Al-rich deposits. However, deposition with Pt C.E. can yield a wide range of deposit compositions irrespective of the nobility of the depositing metals.</p> Graphical Abstract <p></p>

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Regular and equilibrium natures of Al–Mg electrodeposition from chloride-based molten salts

  • 期刊论文

  • 发表日期：

    2026年5月11日

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  • Sreesvarna Bhaskaramohan,
  • M. J. N. V. Prasad,
  • G. V. Dattu Jonnalagadda,
  • Sankara Sarma V. Tatiparti

摘要

Understanding the nature of Al–Mg electrodeposition helps in choosing suitable electrochemical systems for obtaining desirable compositions in deposits. Al–Mg alloys were electrodeposited between deposition potentials of –1.05 and –1.70 V vs open circuit potential using 62AlCl3 + 17NaCl + 15KCl + 6MgCl2 (mol%) at 160—200 °C on Cu employing Al and Pt counter electrodes (C.E.), separately. The deposit composition depends on C.E., with Al C.E. yielding a maximum of 4.06 atom% Mg and Pt C.E. offering up to 13.69 atom% Mg. Contrarily, deposit phases are functions of compositions irrespective of the C.E. Deposits up to ~ 4.49 atom% Mg possess only Al-solid solution; whereas those beyond this composition possess both Al-solid solution and Al12Mg17. When employing Al C.E., the deposit’s less noble metal i.e. Mg content increases with deposition potential and decreases with temperature, suggesting the nature of this electrodeposition as ‘regular’. However, the nature of deposition with Pt C.E. is ‘equilibrium’. These natures are confirmed by the respective composition curves \(\left(\frac{\text{A}\text{l}}{\text{M}\text{g}}{|}_{\text{d}\text{e}\text{p}\text{o}\text{s}\text{i}\text{t}} \text{v}\text{e}\text{r}\text{s}\text{u}\text{s} \frac{\text{A}\text{l}}{\text{M}\text{g}}{|}_{\text{e}\text{l}\text{e}\text{c}\text{t}\text{r}\text{o}\text{l}\text{y}\text{t}\text{e}}\right)\) . The curve of Al C.E. lies completely above the ‘composition reference line’ \(\left(\frac{\text{A}\text{l}}{\text{M}\text{g}}{|}_{\text{d}\text{e}\text{p}\text{o}\text{s}\text{i}\text{t}}=\frac{\text{A}\text{l}}{\text{M}\text{g}}{|}_{\text{e}\text{l}\text{e}\text{c}\text{t}\text{r}\text{o}\text{l}\text{y}\text{t}\text{e}}\right)\) leading to preferential deposition of Al. In contrast, the curve of Pt C.E. transits across this line and goes from Al to Mg preferential regime. Deposition with Al C.E. is useful in obtaining strictly more noble Al-rich deposits. However, deposition with Pt C.E. can yield a wide range of deposit compositions irrespective of the nobility of the depositing metals.

Graphical Abstract