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<p>Titanium (Ti) nano layer was deposited on glass substrates by resistive evaporation at room temperature. After producing pure Ti layers, post-annealing method was used in the presence of a uniform nitrogen flow of 8 sccm at different annealing temperature (120&#xa0;°C, 220&#xa0;°C and 320&#xa0;°C) to TiN layers were formed. Optical reflectance and transmittance of the TiN layers were measured by a spectrophotometer. Kramers-Kronig relations were used to calculate the optical constant. The influence of annealing temperature in the presence of uniform nitrogen flow on optical properties is investigated. Also to make indistinct optical results, a full-potential linearized augmented plane wave (FP-LAPW) method within the generalized gradient approximation (GGA) with PBE and PBEsol functional and local density approximation (LDA) has been used.</p>

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Effect of different annealing temperatures on the structural, optical and electrical properties of titanium nitride thin films by applying Kramers-Kronig and DFT methods

  • 期刊论文

  • 发表日期：

    2026年5月28日

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  • Haleh Kangarlou,
  • Somayeh Asgary

摘要

Titanium (Ti) nano layer was deposited on glass substrates by resistive evaporation at room temperature. After producing pure Ti layers, post-annealing method was used in the presence of a uniform nitrogen flow of 8 sccm at different annealing temperature (120 °C, 220 °C and 320 °C) to TiN layers were formed. Optical reflectance and transmittance of the TiN layers were measured by a spectrophotometer. Kramers-Kronig relations were used to calculate the optical constant. The influence of annealing temperature in the presence of uniform nitrogen flow on optical properties is investigated. Also to make indistinct optical results, a full-potential linearized augmented plane wave (FP-LAPW) method within the generalized gradient approximation (GGA) with PBE and PBEsol functional and local density approximation (LDA) has been used.