Structural, optical, and electrical investigators of ingan nanostructures growing on porous silicon using pulsed laser deposition technique
摘要
Indium gallium nitride (InGaN) nanostructures were deposited on porous silicon (P-Si) substrates using pulsed laser deposition (PLD) to enhance the integration of III-nitride materials with silicon-based optoelectronic platforms. The porous template improved film adhesion, crystallinity, and light–matter interaction, enabling efficient carrier generation and transport. The resulting InGaN/P-Si heterojunction exhibited a broad photoresponse from the UV to visible region, with a peak detectivity of 11.9 × 10¹³ Jones, responsivity of 0.36 A/W, and external quantum efficiency (EQE) of ~ 1.05% at 310 nm. The device also showed rise and decay times (0.56 s and 0.25 s), indicating stable carrier dynamics. These results demonstrate that porous-silicon-assisted PLD growth provides a promising route for achieving high-detectivity, silicon-compatible broadband photodetectors for next-generation optoelectronic systems.