<p>Enhancing the structural, optical and electrical properties of CuO thin films is crucial for their effective integration into modern optoelectronic devices. In this study, tin (Sn) and iron (Fe) co-doped CuO thin films were fabricated on ultrasonically cleaned glass substrates using the sol-gel spin-coating technique, with varying dopant concentrations to optimize their properties. Post-annealing characterization revealed that all samples retained a polycrystalline monoclinic CuO structure, as confirmed by X-ray diffraction (XRD). The crystallite size increased from 19&#xa0;nm to 24&#xa0;nm upon (Sn, Fe) co-doping, accompanied by a decrease in dislocation density from 2.34 × 10<sup>− 3</sup> nm<sup>− 2</sup> to 1.80 × 10<sup>− 3</sup> nm<sup>− 2</sup><sub>,</sub> indicating improved crystallinity. Scanning Electron Microscopy (SEM) analysis showed increased surface uniformity following dopant incorporation. Optical analysis revealed that co-doping significantly decreased transmittance while enhancing visible light absorption. The (1.5 wt% Sn + 0.5 wt% Fe): CuO film maintained a high absorption coefficient (&gt; 10<sup>5</sup> cm⁻<sup>1</sup>) and exhibited a reduced optical band gap of 1.43&#xa0;eV, enhancing the light-harvesting capability. Hall effect measurements demonstrated that the film co-doped with 1.5 wt% Sn and 0.5 wt% Fe exhibited the lowest resistivity (28.5 Ω·cm), highest electrical conductivity (0.035&#xa0;S/cm), and maximum carrier concentration (6.85 × 10<sup>17</sup> cm<sup>− 3</sup>), though with a reduced carrier mobility (0.304 cm<sup>2</sup>/V·s). However, further increase in Fe concentration (≥ 1 wt%) led to structural degradation under identical annealing conditions. Overall, the optimized 1.5 wt% Sn and 0.5 wt% Fe co-doped CuO thin film exhibits superior structural integrity, optical and electrical properties, demonstrating strong potential for application in future optoelectronic and photovoltaic devices.</p>

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Synergistic effects of tin (Sn) and iron (Fe) co-doping on the structural, optical and electrical properties of cupric oxide (CuO) thin films

  • Sukarna Banik,
  • Muhammad Shahriar Bashar,
  • Shahinur Akter,
  • Md. Khalilur Rahman

摘要

Enhancing the structural, optical and electrical properties of CuO thin films is crucial for their effective integration into modern optoelectronic devices. In this study, tin (Sn) and iron (Fe) co-doped CuO thin films were fabricated on ultrasonically cleaned glass substrates using the sol-gel spin-coating technique, with varying dopant concentrations to optimize their properties. Post-annealing characterization revealed that all samples retained a polycrystalline monoclinic CuO structure, as confirmed by X-ray diffraction (XRD). The crystallite size increased from 19 nm to 24 nm upon (Sn, Fe) co-doping, accompanied by a decrease in dislocation density from 2.34 × 10− 3 nm− 2 to 1.80 × 10− 3 nm− 2, indicating improved crystallinity. Scanning Electron Microscopy (SEM) analysis showed increased surface uniformity following dopant incorporation. Optical analysis revealed that co-doping significantly decreased transmittance while enhancing visible light absorption. The (1.5 wt% Sn + 0.5 wt% Fe): CuO film maintained a high absorption coefficient (> 105 cm⁻1) and exhibited a reduced optical band gap of 1.43 eV, enhancing the light-harvesting capability. Hall effect measurements demonstrated that the film co-doped with 1.5 wt% Sn and 0.5 wt% Fe exhibited the lowest resistivity (28.5 Ω·cm), highest electrical conductivity (0.035 S/cm), and maximum carrier concentration (6.85 × 1017 cm− 3), though with a reduced carrier mobility (0.304 cm2/V·s). However, further increase in Fe concentration (≥ 1 wt%) led to structural degradation under identical annealing conditions. Overall, the optimized 1.5 wt% Sn and 0.5 wt% Fe co-doped CuO thin film exhibits superior structural integrity, optical and electrical properties, demonstrating strong potential for application in future optoelectronic and photovoltaic devices.