Structural and optical properties of high crystalline quality orthorhombic к-Ga2O3 heteroepitaxial films grown by HVPE
摘要
Herein, high crystalline quality orthorhombic κ-Ga2O3 epitaxial films were grown on c-Al2O3 substrates via hydride vapor phase epitaxy. A pure-phase κ-Ga2O3 film deposited at 800 ℃ exhibited exceptional crystalline quality, with a symmetric rocking-curve full width at half maximum of 379″. The out-of-plane epitaxial relationship between the κ-Ga2O3 film and c-Al2O3 substrate was determined to be κ-Ga2O3 (001)//Al2O3 (0001), and the in-plane epitaxial relationships were κ-Ga2O3 [010]//Al2O3 [10_10] and κ-Ga2O3 [110]//Al2O3 [1_100]. The film deposited at 800 ℃ showed an average visible-light transmittance of 70%, an optical bandgap of 4.72 eV. Photoluminescence (PL) spectra show that the films exhibit strong ultraviolet (UV)-green emission in the wavelength range of 300 to 700 nm. The Hall mobility of this film was 25 cm2 V−1 s−1, with a carrier concentration of 3.34 × 1018 cm−3.