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<p>This study optimizes sputtered indium tin oxide (ITO) thin films for perovskite solar cells using DC magnetron sputtering and in-situ rapid thermal annealing. A statistical Design of Experiments (DOE) was employed to explore the effects of deposition power, oxygen flow, and annealing conditions on sheet resistance and optical transmission. The optimized ITO films achieved a sheet resistance of 13 Ω/□ at a thickness of 150&#xa0;nm, corresponding to a resistivity of 195 µΩ-cm, with over 95% optical transmission. Structural characterization using atomic force microscopy (AFM), X-ray diffraction (XRD), and Transmission Electron Microscopy (TEM) revealed smoother surfaces, polycrystalline structures with dominant (222) orientation, and detailed grain boundary morphology. The films had very good stoichiometry and chemical homogeneity, which energy-dispersive X-ray spectroscopy (EDS) verified. The annealing significantly improved crystal quality, resulting in better resistivity and superior optical properties. These results prove the capability of advanced sputtering techniques for producing high-quality ITO films tailored for optoelectronic and photovoltaic applications.</p>

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A statistical design of experiments and structural characterization of ITO for perovskite solar cells

  • 期刊论文

  • 发表日期：

    2025年7月22日

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  • Firdos Ali,
  • Subhadra Gupta

摘要

This study optimizes sputtered indium tin oxide (ITO) thin films for perovskite solar cells using DC magnetron sputtering and in-situ rapid thermal annealing. A statistical Design of Experiments (DOE) was employed to explore the effects of deposition power, oxygen flow, and annealing conditions on sheet resistance and optical transmission. The optimized ITO films achieved a sheet resistance of 13 Ω/□ at a thickness of 150 nm, corresponding to a resistivity of 195 µΩ-cm, with over 95% optical transmission. Structural characterization using atomic force microscopy (AFM), X-ray diffraction (XRD), and Transmission Electron Microscopy (TEM) revealed smoother surfaces, polycrystalline structures with dominant (222) orientation, and detailed grain boundary morphology. The films had very good stoichiometry and chemical homogeneity, which energy-dispersive X-ray spectroscopy (EDS) verified. The annealing significantly improved crystal quality, resulting in better resistivity and superior optical properties. These results prove the capability of advanced sputtering techniques for producing high-quality ITO films tailored for optoelectronic and photovoltaic applications.