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<p>To enhance the polishing efficiency and surface quality of spherical SKD11 components, an optimized dual magnetic field generation configuration was developed for magnetorheological polishing. The study integrated electromagnetic simulations with polishing experiments to clarify how magnetic field characteristics govern the rheological response of the magnetorheological fluid and the associated material removal behavior. A multi-objective genetic algorithm was employed to optimize the magnetic field distribution by jointly considering field intensity and stress transmission over the curved surface. The optimized configuration increased the magnetic flux density to approximately 0.74–1.35 T, compared with 0.45–0.93 T in the initial design, resulting in a substantial enhancement of field-induced stresses. Consequently, the yield stress and shear stress within the polishing zone rose to 0.65–1.80&#xa0;kPa and 0.67–1.80&#xa0;kPa, respectively, representing increases of up to approximately 60%. Experimental validation demonstrated that the strengthened and more uniform magnetic field significantly enhanced polishing performance, reducing surface roughness to 7–18&#xa0;nm with an overall reduction of approximately 40%. In addition, the spatial variation in surface roughness was markedly suppressed, indicating improved surface uniformity and form accuracy. These results confirm that the proposed dual magnetic field configuration offers a reliable and efficient solution for high-precision polishing of complex curved surfaces.</p>

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Development of a novel dual magnetic field generation configuration for magnetorheological polishing of complex surfaces

  • 期刊论文

  • 发表日期：

    2026年8月1日

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  • Thanh-Danh Lam,
  • Quoc-Duy Bui,
  • Quoc-Hung Nguyen,
  • Tuan-Kiet Le,
  • Duc-Nam Nguyen

摘要

To enhance the polishing efficiency and surface quality of spherical SKD11 components, an optimized dual magnetic field generation configuration was developed for magnetorheological polishing. The study integrated electromagnetic simulations with polishing experiments to clarify how magnetic field characteristics govern the rheological response of the magnetorheological fluid and the associated material removal behavior. A multi-objective genetic algorithm was employed to optimize the magnetic field distribution by jointly considering field intensity and stress transmission over the curved surface. The optimized configuration increased the magnetic flux density to approximately 0.74–1.35 T, compared with 0.45–0.93 T in the initial design, resulting in a substantial enhancement of field-induced stresses. Consequently, the yield stress and shear stress within the polishing zone rose to 0.65–1.80 kPa and 0.67–1.80 kPa, respectively, representing increases of up to approximately 60%. Experimental validation demonstrated that the strengthened and more uniform magnetic field significantly enhanced polishing performance, reducing surface roughness to 7–18 nm with an overall reduction of approximately 40%. In addition, the spatial variation in surface roughness was markedly suppressed, indicating improved surface uniformity and form accuracy. These results confirm that the proposed dual magnetic field configuration offers a reliable and efficient solution for high-precision polishing of complex curved surfaces.