Scholarlink

<p>Edge effect is a major challenge in computer controlled optical surfacing (CCOS), which easily leads to uneven material removal at the edges of optical components and consequently reduces the overall manufacturing precision. To actively suppress edge effect in bonnet polishing (BP), this study establishes an efficient and active control strategy in pre-polishing of optical components. First, a parametric edge tool influence function (PETIF) is developed by combining finite element contact pressure analysis, explicitly parameterized by tool offset and overhang. Second, an analytical edge error generation model (EEGM) is derived to quantify the relationship between key processing parameters (tool offset, extension distance, and machining interval) and edge errors. Third, a multi-objective optimization strategy is proposed to jointly schedule tool offset and feed rate in the edge region, thereby balancing edge quality and removal efficiency. Single-spot and polishing experiments on K9 glass validate the proposed models, showing good agreement between predictions and measurements. After optimization, the error height, gradient root mean square (GRMS), local height and local length in the edge region decreased by 10%–40% compared with the unoptimized condition. Compared with a conventional process without path extension, the edge error height decreases from 0.76&#xa0;μm to 0.24&#xa0;μm (68.42%), while GRMS decreases from 0.1764&#xa0;μm/mm to 0.1150&#xa0;μm/mm (34.81%). The proposed approach provides a predictive and transferable solution for efficient, active edge control in BP pre-polishing and related sub-aperture finishing processes.</p>

错误：搜索内容不能为空，请输入英文关键词
错误：关键词超出字数限制，请精简
高级检索

Efficient and active suppression for edge effect in pre-polishing of optical components: modeling, analysis, and optimization

  • 期刊论文

  • 发表日期：

    2026年3月4日

查看全文
  • Huiming Feng,
  • Linbin Huang,
  • Peizhi Huang,
  • Xiangbo He,
  • Kai Zhang,
  • Ruirui Li,
  • Jian Shi,
  • Yunfeng Peng

摘要

Edge effect is a major challenge in computer controlled optical surfacing (CCOS), which easily leads to uneven material removal at the edges of optical components and consequently reduces the overall manufacturing precision. To actively suppress edge effect in bonnet polishing (BP), this study establishes an efficient and active control strategy in pre-polishing of optical components. First, a parametric edge tool influence function (PETIF) is developed by combining finite element contact pressure analysis, explicitly parameterized by tool offset and overhang. Second, an analytical edge error generation model (EEGM) is derived to quantify the relationship between key processing parameters (tool offset, extension distance, and machining interval) and edge errors. Third, a multi-objective optimization strategy is proposed to jointly schedule tool offset and feed rate in the edge region, thereby balancing edge quality and removal efficiency. Single-spot and polishing experiments on K9 glass validate the proposed models, showing good agreement between predictions and measurements. After optimization, the error height, gradient root mean square (GRMS), local height and local length in the edge region decreased by 10%–40% compared with the unoptimized condition. Compared with a conventional process without path extension, the edge error height decreases from 0.76 μm to 0.24 μm (68.42%), while GRMS decreases from 0.1764 μm/mm to 0.1150 μm/mm (34.81%). The proposed approach provides a predictive and transferable solution for efficient, active edge control in BP pre-polishing and related sub-aperture finishing processes.