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<p>The profile accuracy and surface integrity of turbine blade tenons significantly impact the stability and reliability of aeroengines. However, current tenon processing method suffers from recrystallization at high temperatures and surface defects, which affects the service life of the aeroengine. To address this issue, a novel uniform-pressure profiling polishing method is proposed. This method ensures consistent normal polishing pressure across peaks, valleys, and sidewalls via a profile-matched flexible tool to achieve uniform material removal. The principle of profiling polishing method is clarified, and the experimental setup is developed based on this principle. Experiments on single-crystal superalloy tenons demonstrate that the polishing method significantly enhances surface integrity by reducing surface roughness <i>S</i>a from 0.63&#xa0;μm to 0.14&#xa0;μm, limiting profile error within 6&#xa0;μm, and eliminating surface defects. Compared to normal profiling polishing tools, the profile error was reduced by approximately 50%. After 1100&#xa0;°C heat treatment, the polished tenon exhibits a recrystallized layer less than 6.5&#xa0;μm thick, compared to 20&#xa0;μm on unpolished tenons, indicating effective suppression of recrystallization. Residual stress analysis further elucidates the mechanism by which profiling polishing inhibits recrystallization, showing that suppression is primarily attributed to the removal of surface tensile stress and plastic deformation.</p>

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A novel profiling polishing method for single crystal superalloy tenon

  • 期刊论文

  • 发表日期：

    2026年1月3日

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  • Pu Qin,
  • Xiaoguang Guo,
  • Zhicheng Zhu,
  • Qikai Li,
  • Baiyun Zhang,
  • Shuaiqi Zhang

摘要

The profile accuracy and surface integrity of turbine blade tenons significantly impact the stability and reliability of aeroengines. However, current tenon processing method suffers from recrystallization at high temperatures and surface defects, which affects the service life of the aeroengine. To address this issue, a novel uniform-pressure profiling polishing method is proposed. This method ensures consistent normal polishing pressure across peaks, valleys, and sidewalls via a profile-matched flexible tool to achieve uniform material removal. The principle of profiling polishing method is clarified, and the experimental setup is developed based on this principle. Experiments on single-crystal superalloy tenons demonstrate that the polishing method significantly enhances surface integrity by reducing surface roughness Sa from 0.63 μm to 0.14 μm, limiting profile error within 6 μm, and eliminating surface defects. Compared to normal profiling polishing tools, the profile error was reduced by approximately 50%. After 1100 °C heat treatment, the polished tenon exhibits a recrystallized layer less than 6.5 μm thick, compared to 20 μm on unpolished tenons, indicating effective suppression of recrystallization. Residual stress analysis further elucidates the mechanism by which profiling polishing inhibits recrystallization, showing that suppression is primarily attributed to the removal of surface tensile stress and plastic deformation.