Adaptive twice laser patterning for aviation thin-wall structures using in situ feature border identification
摘要
Manufacturing lightweight aviation structures via sequential laser patterning faces significant challenges, particularly deformation and dimensional inaccuracies in large-scale thin-walled components after chemical etching. Unlike conventional methods that rely solely on idealized 3D models for trajectory generation, this study introduces a novel approach: dynamically deriving the second laser patterning trajectories by precisely capturing the actual edges of arc-shaped structures formed during the first etching cycle. By integrating point-cloud acquisition with advanced data processing, our solution enables accurate characterization of post-etching geometries. A customized laser processing system was developed, combining a CO₂ laser with a 6-DOF motion platform and a structured-light 3D scanner to reconstruct a digital twin of the workpiece. Through parametric optimization, we identified critical processing conditions—including a laser power of 5 W and a beam inclination of 40°—that achieve complete maskant ablation without substrate damage. Experimental validation on curved components demonstrated the successful fabrication of sequential arc-shaped and “wine glass-shaped” structures, confirming the method’s ability to compensate for etching-induced deformations and processing errors. This work establishes an automated, high-precision framework for multi-step laser patterning in aerospace manufacturing, offering a robust solution to existing challenges in dimensional accuracy.