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<p>This paper presented a practical approach to model and solve a <i>strongly coupled elastohydrodynamic lubrication</i> (EHL) problem. Our previous study had found that existing CAE tools are not capable of modelling a strongly coupled EHL problem in one parametrized simulation model. Predicting the friction of a seal subjected to a reciprocating sliding motion at its contact is used as a case study to illustrate the proposed approach and it is implemented in Simula/Abaqus. The results have shown the effectiveness of the proposed method in dealing with the couplings in an EHL problem, and it is extendable to solve other multi-physics problems. While our objective is to illustrate the feasibility of using Simula/Abaqus to predict mixed lubrication conditions, the predicted value of a friction has not been validated by the experiments due to the difficulties in measuring the distributions of coupled film thickness, pressure, and roughness.&#xa0;</p>

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A practical approach to model tightly coupled elastohydrodynamic lubrication (EHL) at sliding contacts

  • 期刊论文

  • 发表日期：

    2025年3月15日

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  • Zhuming Bi,
  • Donald Mueller,
  • Aki Mikkola

摘要

This paper presented a practical approach to model and solve a strongly coupled elastohydrodynamic lubrication (EHL) problem. Our previous study had found that existing CAE tools are not capable of modelling a strongly coupled EHL problem in one parametrized simulation model. Predicting the friction of a seal subjected to a reciprocating sliding motion at its contact is used as a case study to illustrate the proposed approach and it is implemented in Simula/Abaqus. The results have shown the effectiveness of the proposed method in dealing with the couplings in an EHL problem, and it is extendable to solve other multi-physics problems. While our objective is to illustrate the feasibility of using Simula/Abaqus to predict mixed lubrication conditions, the predicted value of a friction has not been validated by the experiments due to the difficulties in measuring the distributions of coupled film thickness, pressure, and roughness.